Home > Search Results: keywords:"Extreme Ultraviolet mirror"
Search:
Search Tips :: Advanced Search
Search collections:
Sort by: Display results: Output format:
National Repository of Grey Literature 1 records found  Search took 0.00 seconds. 
SMV-2019-16: Deposition technology and implementation of EUV multilayer system
 Fořt, Tomáš
We have developed deposition technology and implementation of multilayer systems of Mg/Si or molybdenum and silicon prepared by magnetron sputtering. Interface roughness has to be smaller than 0.1 nm and reproducibility of bilayer thickness (i.e. molybdenum or Mg and silicon) must be better that 0.1 nm. This multilayer system was used as a EUV mirror.
Detailed record

Interested in being notified about new results for this query?
Subscribe to the RSS feed.
Digital Repository :: Search :: Submit :: Personalize :: Help
Powered by Invenio v1.1.2
Maintained by admin.invenio@techlib.cz
This site is also available in the following languages:
Česky  English